多层膜聚光镜对Schwarzschild显微镜成像均匀性的影响  

Influence of multilayer films condenser on imaging uniformity of Schwarzschild microscope

作　　者：王新[1,2] 穆宝忠[1,2] 黄怡[1,2] 翟梓融[1,2] 伊圣振[1,2] 蒋励[1,2] 朱京涛[1,2] 王占山[1,2] 刘红杰[3] 曹磊峰[3] 谷渝秋[3] 

机构地区：[1]同济大学物理系,精密光学工程技术研究所,上海200092 [2]上海市特殊人工微结构材料与技术重点实验室,上海200092 [3]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2011年第5期1259-1263,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(10825521,10773007);上海市科学技术委员会科研计划项目(0952nm06900)

摘　　要：提出了利用多层膜聚光镜提高Schwarzschild显微镜成像均匀性的方法。设计了聚光镜的光学结构,使80%的等离子体辐射能量会聚在约0.8 mm直径的范围内。根据成像系统的工作波长和光线在聚光镜表面的入射角度,设计了Mo/Si周期多层膜,制备了聚光镜光学元件,膜层周期厚度为9.64 nm,周期数为30,对18.2 nm波长的峰值反射率为51.7%。利用所设计的聚光镜作为照明系统,对Schwarzschild物镜进行了网格成像实验。结果表明:在1.2 mm视场内可以实现2.5μm的空间分辨力,并且完全消除了物镜中心遮拦所造成的像面光强分布不均匀性。The method for improving the uniformity of the image using multilayer films condenser is proposed.The optical structure of the condenser is designed,which concentrates 80% energy radiated by plasma to about 0.8 mm diameter range.Based on the system＇s wavelength and incidence angle of light,the Mo/Si multilayer films with period of 9.64 nm and layers of 30 is designed and the coatings are deposited with magnetron sputtering.The reflectivity of optical elements at 18.2 nm is 51.7%.The grid backlit by EUV rays focused using condenser is imaging via Schwarzschild microscope on CCD.The results show that spatial resolution of 2.5 μm can be achieved in the 1.2 mm field,and the non-uniformity of image caused by the obscuration of objective is eliminated absolutely.

关 键 词：Schwarzschild显微镜 激光等离子体 聚光镜 MO/SI多层膜 空间分辨力 

分 类 号：O434.1[机械工程—光学工程]