沉积温度对HfO_2薄膜应力及光学特性的影响  

Influence of deposition temperature on stress and optical properties of HfO_2 films

作　　者：齐瑞云[1] 吴福全[1] 郝殿中[1] 王庆[1] 韩培高[1] 

机构地区：[1]曲阜师范大学激光研究所山东省激光偏光与信息技术重点实验室

出　　处：《光电子．激光》2011年第6期884-887,共4页Journal of Optoelectronics·Laser

基　　金：山东省自然科学基金资助项目(ZR2009GL010)

摘　　要：采用电子枪蒸镀法制备了不同沉积温度下的HfO2薄膜样品,利用ZYGO干涉仪、UV3101-PC分光光度计、X射线衍射(XRD)仪和冷场发射扫描电镜(SEM)对样品进行了测试。结果表明,在实验所选择的沉积温度下,制备的薄膜都是非晶态结构;残余应力和本征应力均为张应力,沉积温度低于220℃时热应力对残余应力起主要作用;沉积温度高于220℃时,本征应力对残余应力起主要作用,且沉积温度220℃时残余应力最小;HfO2折射率随沉积温度的升高而增大,不同沉积温度下制备的薄膜折射率都是正常色散;沉积温度220℃下制备的薄膜平整度最好。这些结果可以为镀制高质量HfO2薄膜提供参考。In order to study the influence of the deposition temperature on stress and optical properties of HfO2 films,we fabricated HfO2 thin films using electron beam evaporation method under different deposition temperatures.We used ZGYO interferometer,UV3101-PC spectrophoto-meter,X-ray diffraction instrument and emission scanning electron microscopy to test the samples.The experimental results show that the HfO2 films are amorphous at selected deposition temperatures,and the residual stress and intrinsic stress are both tensile stress.When the temperature is lower than 220 ℃,thermal stress plays a major role on the residual stress,while the intrinsic stress plays a key role on the residual stress when the deposition temperature is higher than 220 ℃.The HfO2 films have minimum residual stress at 220 ℃.The refractive index becomes higher with increasing the deposition temperature,and the refractive index follows normal dispersion.The HfO2 films have the best flatness at 220 ℃.The results provide references for making high-quality HfO2 films.

关 键 词：残余应力 本征应力 HFO2薄膜 沉积温度 光学特性 微结构 

分 类 号：O484.5[理学—固体物理]