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机构地区:[1]山东大学光电系 [2]山东大学晶体材料国家重点实验室
出 处:《山东大学学报(自然科学版)》1999年第1期68-73,共6页Journal of Shandong University(Natural Science Edition)
基 金:"八六三"资助项目
摘 要:用椭偏光谱法对用MOCVD方法在GaAs衬底上生长的GaxIn1-xP掺Si及掺Zn样品在室温下,可见光区得到的光学常数求其介电函数三级微商谱.将用于分析调制反射谱的三点比例法推广,并用来分析介电函数的三级微商谱.精确地得到样品的带隙Eg,Eg+△0以及Eg以上成对结构跃迁的能量位置及其间隔.计算了Eg以及费米能级的相对位置.将实验值与计算值比较,分析其差异的原因。The optical constants of the doped Si or Zn Ga x In 1 x P samples grown by MOCVD on the GaAs substrates were measured at room temperature in the region of visible light by using the ellipsometric spectroscopy.The third derivative spectra of the optical constants were evaluated.Extending the threepoint scaling used in the analysis of the modulated reflective spectrum,the third derivative spectra of the dielectric functions can be analyzed.Thereby the accurate Eg,Eg+Δ 0 and the energy position and its gap of the paired structure above Eg.Were obtained.Eg and the position of the Fermi energy level were also calculated.The experimental and theoretical values were compared and the reason of difference between them was analyzed.The existence of ordered structure of samples was found.
分 类 号:TN304.26[电子电信—物理电子学] O472.3[理学—半导体物理]
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