TiN/AlN纳米多层膜的研究  

A Study of TiN/AlN Nano Multilayers

作　　者：李戈扬[1] 施晓蓉[1] 吴亮[1] 许俊华[1] 戎咏华[2] 张惠娟[2] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030 [2]上海交通大学国家教委高温材料及高温测试开放实验室,上海200030

出　　处：《材料工程》1999年第11期6-9,13,共5页Journal of Materials Engineering

摘　　要：采用反应溅射法制备了ＴｉＮ／ＡｌＮ 纳米多层膜， 并通过ＸＲＤ， ＨＲＥＭ 和显微硬度计对多层膜的调制结构和力学性能进行了研究。结果表明： ＴｉＮ／ＡｌＮ 纳米多层膜有较好的调制结构。小调制周期时， ＡｌＮ 调制层以ＦＣＣ 结构在ＴｉＮ 调制层上外延生长。调制周期增大，ＡｌＮ 调制层中出现六方晶型。ＴｉＮ／ＡｌＮ 的显微硬度随调制周期的减小单调上升， 并在调制周期＝ ２ｎｍ 时达到最高值ＨＫ３２９３。硬度的增高极有可能是小调制周期时立方ＡｌＮTiN/AlN nano multilayers were fabricated by reactive sputtering method The microstructure and mechanical properties were determined by XRD, HREM and microindentor respectively The results show that TiN/AlN nano multilayers have a good periodic modulation structure AlN layers grow epitaxilly on the TiN layers as FCC structure in nano multilayer with short modulation wavelength However, hexagonal crystals appear in AlN layers with modulation wavelength increasing The microhardness of TiN/AlN nano multilayers increases with reduction of their modulation wavelength and reaches the maximum value HK3293 at =2nm

关 键 词：纳米多层薄膜 反应溅射 调制结构 薄膜 

分 类 号：O484.8[理学—固体物理]