微波等离子体CVD金刚石膜的温度效应  

Effects of Temperature on Diamond Films Synthesized by MPCVD

作　　者：顾利萍[1,2] 曹永浩[1] 熊安邦[1] 

机构地区：[1]常熟理工学院物理与电子工程学院,江苏常熟215500 [2]常熟理工学院江苏省新型功能材料重点建设实验室,江苏常熟215500

出　　处：《常熟理工学院学报》2011年第4期32-34,共3页Journal of Changshu Institute of Technology

摘　　要：采用微波等离子体CVD法,在其它生长条件和参数不变情况下,研究温度对制备金刚石膜的影响.通过扫描电镜、X射线衍射分析仪和拉曼光谱对样本的形貌和金刚石膜的质量进行了表征.The effects of temperature on the growth and quality of diamond films synthesized by microwave plasma assisted chemical vapor deposition were studied in this paper while all other process parameters remained unchanged..The morphologies of growth surface and qualities of the deposited samples were characterized by scanning election microscopy,X-ray diffractmeter and Raman spectra methods respectively.

关 键 词：微波等离子体CVD 金刚石膜 温度 

分 类 号：O484[理学—固体物理]