磁控溅射法制备非晶碳膜及其光学特性  

Optical Characterization of α-C Film via Magnetron Sputtering

作　　者：张月蘅[1] 徐政[1] 黄志强[1] 甘肇强[2] 

机构地区：[1]同济大学材料科学与工程学院,上海200092 [2]苏州大学物理系,江苏苏州215006

出　　处：《同济大学学报（自然科学版）》1999年第6期681-684,共4页Journal of Tongji University:Natural Science

摘　　要：利用射频磁控溅射法成功制备了类金刚石薄膜，研究了溅射功率和基片温度对所沉积的薄膜的性能的影响．对所制备的类金刚石薄膜用拉曼光谱、紫外光谱进行了表征，所沉积的类金刚石碳薄膜是簇状分布的ＳＰ２ 碳键和网状分布的ＳＰ３ 碳键互相随机交织在一起的非晶结构．还研究了非晶碳膜的光学性质和电学性质，探索了制备各种不同光学带隙的非晶碳膜的工艺条件。The diamond-like carbon (DLC) films are prepared by rf magnetron sputtering. The effects of the sputtering power and the substrate temperature on the character of the films are studied. It is investigated by Raman spectra and Ultraviolet spectra that the DLC films are amorphous structure interweaved by SP 2 and SP 3 hybrid bonds. The reliable experiment data are provided for the practical application of this kind of film through the study on optical and electric characterization as well as the fabrication conditions of various optical gap films.

关 键 词：磁控溅射 类金刚薄膜 非晶碳薄膜 光学特性 

分 类 号：O484.1[理学—固体物理] O484.41[理学—物理]