二氧化钛太阳能电池减反射膜结构和光学特性  

Structure and optical properties of titanium dioxide antireflection thin films for solar cell

作　　者：赵保星[1] 周继承[1] 荣林艳[1] 彭银桥[1] 

机构地区：[1]中南大学能源科学与工程学院,湖南长沙410083

出　　处：《中南大学学报（自然科学版）》2011年第7期2147-2151,共5页Journal of Central South University:Science and Technology

基　　金：湖南省重大科技专项项目(08FJ1002)

摘　　要：用溅射功率为100~500 W的直流反应磁控溅射法制备出不同结构与特性的TiO2薄膜样品;采用原子力显微镜（AFM）、X线衍射仪（XRD）、傅里叶红外光谱（FTIR）和紫外可见光分光光度计对薄膜的形貌、结构及光学特性进行表征;研究溅射功率对薄膜的结构、形貌及光学特性的影响。研究结果表明：沉积态薄膜均为无序结构,氧化物溅射模式下沉积的薄膜为透明状态,金属模式下沉积的薄膜不透明,TiO2薄膜的折射率随着溅射功率变化在1.8~2.3之间变化;在低功率制备的沉积态薄膜存在TiO0.5微晶,它使薄膜样品的透过率降低,这主要是TiO0.5微晶对光波的强烈吸收所致;400 W溅射功率下制备出适合太阳能电池减反射膜应用的透过率高及折射率大的TiO2减反膜。TiO2 films with different structure properties were prepared with varying sputtering power from 100 W to 500 W.Film surface morphology,structure,and optical properties were measured with step profiler,AFM,X-ray diffraction,FTIR,UV-VIS transmittance spectroscope and ellipsometry respectively.The influence of the sputtering power on the films structure,morphology and optical properties was investigated.The results show that the deposited films are in disorder state.Films deposited in oxide mode are transparent while those in metal mode are opaque.The refraction index varies from 1.8 to 2.3.The film prepared at low sputtering power possesses TiO0.5 small crystal whose absorption has hindered the transmittance.The optimum sputtering power is 400 W.

关 键 词：二氧化钛 直流反应磁控溅射 溅射功率 减反射薄膜 光学特性 

分 类 号：O484[理学—固体物理]