CMP中真空供应系统的设计  

Design on the Vacuum Provide System for CMP

作　　者：周国安[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2011年第8期9-11,18,共4页Equipment for Electronic Products Manufacturing

摘　　要：针对CMP在低生产量及实验室条件下对真空供应系统的特别要求:(1)持续稳定的真空供应;(2)能够及时处理倒流液体;(3)真空电机不易长时间连续工作的要求,从气动性、硬件电路和软件流程图进行全面设计:增加独立的真空槽体和排液槽体,在正常运行情况下二者串联增加真空供应容积,并且自主收集倒流废液,而排液中依然可保证真空稳定供应;增加SMC真空开关及相应的控制系统,保证真空处于最低和最高设置负压之间,同时实现真空电机间歇式工作。从根本上解决了以上问题,且控制系统简洁可靠,满足生产需要。The paper gives a whole design by pneumatic、hardware and software aspect according to the special requirement of vacuum system for low throughput and Lab which is：（1） Sustained and stable vacuum providing;（2） Dealing with the backflow fluid on time;（3） Vacuum motor can not work for long time without break.To increase separate vacuum tank and drain tank in my design,the both tank will be connected together in order to make the volume bigger under the normal condition,Meanwhile the drain tank can collect the backflow fluid.The system can keep provide vacuum continually even though during draining the fluid period;To increase the SMC switch and controlling system,which can confirm to provide the vacuum between the max and min setting value,and achieve the vacuum motor by intermission working style.The design solves the problems above thoroughly,besides the control system is simple and reliable,all of these can meet the production.

关 键 词：化学机械平坦化 真空系统 电磁阀 继电器 真空槽体 

分 类 号：TN305.2[电子电信—物理电子学]