高速生长CVD金刚石单晶及应用  

High-rate growth of CVD single-crystal diamond and its application

作　　者：王启亮[1] 吕宪义[1] 成绍恒[1] 张晴[1] 李红东[1] 邹广田[1] 

机构地区：[1]吉林大学超硬材料国家重点实验室,长春130012

出　　处：《超硬材料工程》2011年第2期1-5,共5页Superhard Material Engineering

基　　金：国家自然科学基金(No.50772041;51072066);新世纪优秀人才支持计划(NCET;No.06-0303);吉林省科技厅科技发展计划项目(No.20080509)

摘　　要：文章简要地介绍了近年来国内外CVD金刚石单晶的高速生长和应用进展。实验中采用微波等离子体化学气相沉积(CVD)方法,同质外延高速生长金刚石单晶,通过改变反应腔压强、反应气氛(在CH4/H2中引入氮气N2、二氧化碳CO2、氧气O2、)等,调制单晶生长速率、质量、颜色、表面粗糙度、光谱等特性。利用高温氢等离子体进行退火,可使金刚石单晶的颜色有很大的改善。研制了CVD金刚石单晶刀具,用于金属材料的曲面镜面加工。In this paper,we briefly review the resent great improvements achieved for the high rate growth and applications of CVD single-crystal diamonds（SCDs）.We have investigated the high rate homoepitaxial growth of SCDs dependent on reaction pressure,atmosphere（introducing the gaseous N2,O2,CO2 in H2/CH4） by microwave plasma CVD.The growth rate,the quality,color,surface roughness,and photoluminescence properties are efficiently controlled.Annealing by hydrogen plasma,the color of the SCDs has been great improved.We developed a CVD SCD cutter using for the curved mirror face polishing of metallic material.

关 键 词：高速生长 CVD 金刚石单晶 退火 金刚石工具 

分 类 号：TQ164[化学工程—高温制品工业]