ZnO薄膜气相法制备  

Preparation of ZnO Thin Films by Thermal Vapor Condensation

作　　者：鲁俊雀[1] 王秀峰[1] 伍媛婷[1] 许雅琴[1] 

机构地区：[1]陕西科技大学材料科学与工程学院,西安710021

出　　处：《材料导报》2011年第19期64-67,共4页Materials Reports

基　　金：陕西省自然科学基金(2009JM6008;2010JQ6006);陕西省教育厅科研计划项目(2009JK362)

摘　　要：ZnO薄膜具有压电、光电、压敏、气敏、发光等多种特性,应用十分广泛。介绍了ZnO薄膜气相法制备原理中的各类主要方法,包括脉冲激光沉积、磁控溅射、分子束外延、金属有机化合物化学气相沉积、单源化学气相沉积和等离子体增强化学气相沉积等技术;分析了这些方法的优缺点;展望了ZnO薄膜今后的研究方向。ZnO thin films have many characteristics such as piezoelectricity, photoelectricity voltage-sensitive, gas-sensitive, luminescence, etc. Therefore, it can he used in various fields. This article introduces some important methods of ZnO thin films which were prepared by thermal vapor condensation, such as pulsed laser deposition, magnetron sputtering, molecular beam epitaxy, metal-organic chemical vapor deposition, single-source chemical vapor deposition and plasma enhanced chemical vapor deposition, etc. The advantages and disadvantages of these methods are analyzed. Finally, the research direction of ZnO thin films in the future is prospected.

关 键 词：氧化锌薄膜 ZNO薄膜 气相法 

分 类 号：TB383[一般工业技术—材料科学与工程]