硅基光电子学中的SOI材料  

SOI Materials in silicon-based optoelectronics

作　　者：陈媛媛[1] 

机构地区：[1]北京工商大学计算机与信息工程学院,北京100048

出　　处：《激光与红外》2011年第9期943-947,共5页Laser & Infrared

摘　　要：SOI材料是近年来应用于硅基光电子学中的一种重要的光波导材料。本文首先简要介绍了常见的SOI材料的制备方法,包括注氧隔离(SIMOX-SOI)、硅键合背面腐蚀(BE-SOI)和注氢智能剥离(Smart Cut)等,并比较了它们各自的特点和优劣。其次介绍了SOI材料加工制造波导的基本工艺,包括光刻和刻蚀,其中刻蚀又分为干法刻蚀和湿法腐蚀。SOI material is an important kind of optical waveguide materials for silicon-based optoelectronics applications.In this paper,the common preparation methods of SOI materials,including SIMOX-SOI,BE-SOI,Smart Cut,are introduced at first and their different characteristics are compared.Then,the common technology to make optical waveguide using SOI materials,including photolithography and etching,are introduced.Among which,the etching technology is divided into wet-etching and dry-etching.

关 键 词：硅基 光电子学 SOI 光波导材料 光波导器件 

分 类 号：TN252[电子电信—物理电子学]