氧流量对磁控溅射ZrO_2薄膜光学性能的影响  

Influence of Oxygen Flow on Optical Properties of ZrO_2 Films by Magnetron Sputtering

作　　者：戚云娟[1] 朱昌[1] 梁海峰[1] 

机构地区：[1]西安工业大学陕西省薄膜技术与光学检测实验室,西安710032

出　　处：《表面技术》2011年第5期18-20,53,共4页Surface Technology

摘　　要：采用反应磁控溅射法在k9玻璃基底上沉积ZrO2薄膜。用轮廓仪、椭圆偏振仪和分光光度计,分别测试薄膜的厚度、折射率、消光系数和透过率,研究了不同氧流量对薄膜沉积速率和光学特性的影响。结果表明:随着氧气流量增加到22～24mL/min(标准状态下)时,沉积速率从6.8nm/s下降到2.5nm/s,并趋于稳定;在入射波长630nm处,薄膜的折射率为1.95,消光系数小于10-5;在可见及近红外波段,薄膜平均透过率高于80%。ZrO2 thin films were deposited on k9 glass substrate by reaction magnetron sputtering. The film thickness, refractive index, extinction coefficient and transmittance were investigated by talysurf, ellipsometer and spectrophotometer, the influence of different oxygen flow on deposition rate and optical properties was discussed. The results show that the deposition rate decreases significantly from 6.8 nm/s to 2.5 nm/s and tend to be stable with the increasing of the oxygen flow between 22424 mL/min（standard state） ; The refractive index is 1.95 and the extinction coefficiem is less than 10^-5 at the wavelength 630 nm ;The average transmittance of ZrO2 films is higher than 80% in the spectrum of and near-infrared.

关 键 词：ZRO2薄膜 反应磁控溅射 氧流量 光学特性 

分 类 号：TG174.444[金属学及工艺—金属表面处理] O484.4[金属学及工艺—金属学]