干涉高斯光诱导的表面等离子激元驻波场的分析  

Analysis of Surface Plasmon Polaritons Standing Wave Field Induced by Interference Gaussian Beams

作　　者：黄频波[1] 邹文栋[1] 郭斐[1] 江茂清[1] 

机构地区：[1]南昌航空大学教育部无损检测技术重点实验室,江西南昌330063

出　　处：《光学学报》2011年第10期219-224,共6页Acta Optica Sinica

基　　金：江西省自然科学基金(2008GZW0011)资助课题

摘　　要：考虑到实际入射光强的空间分布不均匀,基于Kretschmann模型并采用角谱方法分析模拟了两束高斯光干涉诱导表面等离子激元(SPP)驻波场。与理想平面波不同,高斯光诱导的SPP干涉条纹幅值大小不等,分布复杂,这表明光强空间非均匀程度会严重地影响到曝光深度的分布。还分析了金属薄膜的厚度、损耗以及光刻胶的介电常数对SPP驻波场的影响,并得出不恰当的金属板厚和细微损耗都会极大削弱SPP驻波场,而如果光刻胶的介电常数过大则有可能产生不了表面等离子体共振的结论。As the actual light intensity has nonuniform spatial distribution,the surface plasmon polariton（SPP） standing wave field induced by two interference Gaussian beams is simulated using angular spectrum representation on the basis of the Kretschmann model.The Gaussian beams-induced SPP interference fringes have complex amplitude distribution,which is distinctly different from those induced by ideal plane wave.This indicates that the spatial non-uniformity of light intensity can seriously affect the distribution of exposure depth.The effects of the thickness,loss of metal films and the photoresist dielectric constant on the standing wave field are also investigated,and the results show that inappropriate metal thickness and tiny absorption loss will greatly weaken field intensity of the standing wave.Besides,the surface plasmon resonance will not be generated if the photoresist dielectric constant is too large.

关 键 词：相干光学 干涉光刻 高斯光 表面等离子激元 

分 类 号：O436.1[机械工程—光学工程]