TiO_2薄膜折射率的调控方法  

Regulation of the Refractive Index of TiO_2 Films

作　　者：周灵平[1] 罗小兰[1] 朱家俊[1] 彭坤[1] 李德意[1] 李绍禄[1] 

机构地区：[1]湖南大学材料科学与工程学院,湖南长沙410082

出　　处：《湖南大学学报（自然科学版）》2011年第9期59-63,共5页Journal of Hunan University:Natural Sciences

基　　金：国家自然科学基金资助项目(10904071)

摘　　要：采用电子束蒸发技术及其辅助工艺制备了TiO2薄膜,利用X射线衍射(XRD)、X射线光电子能谱(XPS)和原子力显微镜(AFM)对薄膜的组织结构进行了表征,采用紫外可见分光光度计研究了TiO2薄膜的折射率变化.结果表明:传统电子束蒸发镀制的TiO2薄膜的折射率低于块体值,通过调节氧气压、沉积速率和衬底温度可在1.97～2.22范围内调控其折射率;采用离子束辅助轰击可使薄膜致密化,获得折射率在2.06～2.42范围内变化的TiO2薄膜;利用斜角入射沉积可控制薄膜生长角度与孔隙率,实现折射率在1.71～2.18范围内的调控.TiO2 films were prepared by electron beam evaporation（E-beam）.X-ray diffraction（XRD）,X-ray photoelectron spectroscopy（XPS） and atomic force microscope（AFM） were applied to characterize the film＇s structure.UV-visible spectrophotometer was used to analyze the changes of refractive index（RI）.It has been found that the RI of TiO2 film prepared by E-beam is lower than that of the bulk.It can be regulated within 1.97~2.22 by controlling O2 pressure,deposition rate and substrate temperature.Compact film with RI within 2.06~2.42 is obtained by ion beam assisted deposition.Glancing angle deposition can realize the regulation of RI within 1.71~2.18 by controlling the growing angle and the porosity of films.

关 键 词：薄膜 折射率 电子束蒸发 

分 类 号：O484.41[理学—固体物理]