3.6m大口径镀膜机膜厚均匀性分析  

Analysis of Film Thickness Uniformity for Large Aperture Coater of 3.6 m in Diameter

作　　者：艾万君[1,2] 熊胜明[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209 [2]中国科学院研究生院,北京100049

出　　处：《光电工程》2011年第11期73-78,共6页Opto-Electronic Engineering

摘　　要：分别建立了旋转平面与球面夹具配置下的薄膜膜厚均匀性理论计算模型,对3.6m大口径镀膜机下直径为2.6m基板的膜厚均匀性进行了研究。为了改善膜厚均匀性,分别采用两个蒸发源和三个蒸发源进行蒸镀。薄膜的膜厚不均匀性通过理论计算模型进行优化计算得到。对于两个蒸发源,分别得到了两旋转夹具配置下的最优几何配置,对应的膜厚不均匀性最小值分别为7.62%和5.58%。对于三个蒸发源,也分别得到了两旋转夹具配置下的最优几何配置,对应的膜厚不均匀性最小值分别为5.79%和3.48%。结果表明:采用三个蒸发源能更好的改善膜厚分布,而且旋转球面夹具配置下得到的膜厚均匀性整体上较好。The theoretical calculation models for the rotating flat and spherical fixture configurations have been established respectively and the thickness uniformity of 2.6 m substrates in large aperture coater of 3.6 m in diameter have been studied. In order to improve the thickness uniformity, two sources and three sources have been employed. The thickness nonuniformity was acquired via the optimization calculations using the theory models. The optimal geometric configurations were obtained for two sources with the two rotating fixture configurations respectively, and the corresponding minima of thickness nonuniformity were 7.62% and 5.58%, respectively. For three sources, in the same way, the corresponding minima of thickness nonuniformity were 5.79% and 3.48%, respectively. It is found that compared with two sources, three sources can improve the thickness distribution to a great extent. Moreover, the thickness distribution obtained with the rotating spherical fixture configuration performs well as a whole.

关 键 词：大口径镀膜机 理论计算模型 膜厚分布 均匀性 薄膜 

分 类 号：O484.4[理学—固体物理]