基于数字微镜的无掩模数字光刻系统的研制  

Research on Non-Mask Digital Lithograph System Based on Digital Micro-mirror Device

作　　者：陈劲松[1] 

机构地区：[1]安徽财经大学电子信息工程系,安徽蚌埠233000

出　　处：《压电与声光》2011年第6期856-858,862,共4页Piezoelectrics & Acoustooptics

摘　　要：研究了一种基于数字微镜的无掩模光刻系统。利用数字微镜输出的高精度数字掩模,结合高质量的高倍精缩投影光学系统,理论上完全可实现亚微米级衍射微光学元件的制作。该文从照明系统、数字微镜芯片、精缩物镜设计等方面进行了系统总体设计。利用该系统成功制作了5×5达曼光栅、8台阶闪耀光栅和8台阶菲涅耳透镜,进一步论证了该系统的可行性。A non-mask lithograph system based on digital micro-mirror device （DMD） is researched. Using the high precision digital mask from DMD, and combined with high quality reduction projecting system, the fabrication of sub-micron diffractive optical elements can he realized completely in theory. The overall design of system is given including lighting system, DMD chip and reduction field lens. Using the system, 5 × 5 dammann grating, eight-step blazed grating and eight-step Freshet lens is manufactured successfully, further demonstrating the feasibility of this system.

关 键 词：数字微镜 灰度掩模 数字光刻 

分 类 号：TB133[机械工程—光学工程]