占空比对中频磁控溅射(Al,Ti)N周期性多层膜组织与性能的影响  

Structure and Mechanical Performance of(Al,Ti)N Periodical Multilayer Films Deposited by MF Magnetron Sputtering

作　　者：孙丽丽[1] 杨会生[2] 成浩[1] 汪爱英[1] 

机构地区：[1]中国科学院宁波材料与技术研究所,浙江宁波315201 [2]北京科技大学材料物理与化学系,北京100083

出　　处：《中国表面工程》2011年第6期47-52,F0003,共7页China Surface Engineering

基　　金：浙江省宁波市自然科学基金项目(2009A610034)

摘　　要：采用LABVIEW软件控制N2气体流量,辅助中频磁控溅射制备不同占空比的(Al,Ti)N周期性多层膜,分别利用X射线衍射仪、场发射扫描电镜、纳米硬度仪研究了(Al,Ti)N周期性多层膜的组织结构和力学性能,研究表明:不同占空比下的薄膜只存在面心立方结构,多层膜具有一定的择优取向,择优取向随着占空比的改变而变化,当占空比为50%时,薄膜中存在(111)和(220)两种取向;多层的结构可以提高薄膜的结合强度和力学性能,获得的多层膜硬度最高为33.58GPa,临界载荷在40N左右,磨损情况也得到了明显的提高,主要是以粘合磨损为主;氮流量的增加有利于多层膜的性能改善。（Al, Ti）N multilayer films were grown by MF magnetron co-sputtering with LABVIEW software controlling the flow of N2, the morphologies and mechanical properties of the films were characterized with X- ray diffraction （XRD）, scanning electron microscope （SEM） and nano-indenter, respectively. The results showed that only coexistence of cubic structures was ohserved at different duty ratios, （Al, Ti）N multilayer films showed the preferred orientation of crystals and the preferred orientation vary with duty ratios, when the duty ratio was 50%, （111） peak and （220） peak turned to be stronger. The mechanical properties and adhesion between the film and the substrate were enchanced because of the multilayer structure. The hardness was reached to 33.58 GPa and the critical load was around 40 N, meanwhile, the wear of multilayer films was obviously improved too, which are bonded in the course of wearing. The performance of multilayer films got better with the increase of N2 flow.

关 键 词：LABVIEW多层膜 中频磁控溅射 硬度 择优取向 

分 类 号：TG174.444[金属学及工艺—金属表面处理]