AZ31镁合金基材非平衡磁控溅射镀膜工艺研究  

Surface Modification of AZ31 Mg Alloys by Depositing Silicon Nitrides Films

作　　者：牟宗信[1] 臧海蓉[1] 刘冰冰[1] 林曲[1] 丁安邦[1] 王春[1] 董闯[1] 

机构地区：[1]大连理工大学三束材料改性教育部重点实验室,大连116024

出　　处：《真空科学与技术学报》2012年第1期6-10,共5页Chinese Journal of Vacuum Science and Technology

基　　金：教育部科技创新工程重大项目培育资金项目资助(707015);辽宁省教育厅资助科研项目

摘　　要：采用中频孪生靶非平衡磁控溅射技术在AZ31镁合金基底上制备出氮化硅薄膜。利用傅里叶变换红外光谱仪、电子探针、X射线衍射仪等研究了氮气流量比率对氮化硅薄膜的成分、微观结构的影响。通过对薄膜力学性能和抗腐蚀性能的检测分析了氮化硅薄膜对AZ31镁合金基底表面改性的作用。结果表明:中频孪生非平衡磁控溅射技术制备的薄膜为非晶态富N氮化硅。随着氮气流量比率的增加,薄膜的沉积速率降低,Si含量减少。在AZ31镁合金基底上制备氮化硅薄膜有效提高了基底的力学性能和抗腐蚀性能,显微硬度得到显著提高,腐蚀电流密度降低了3个数量级,并且薄膜与基底之间的结合力良好。The silicon nitride thin films were deposited on substrates of the AZ31 magnesium alloys by mid-frequency dual-target unbalanced magnetron sputtering.The impacts of the growth conditions,including the substrate temperature,gas flow rate,and deposition rate,on the surface modification were studied.The microstructures and properties of the coating were characterized with X-ray diffraction,Fourier transform infrared（FTIR） spectroscopy,and electron probe micro-analyzer.The results show that the amorphous N-rich SiNx film significantly modifies the surface mechanical properties,including the hardness and corrosion resistance,and that the deposition rate increases with an increase of the nitrogen flow rate.Possible mechanisms responsible for the surface modifications were also tentatively discussed.

关 键 词：氮化硅薄膜 镁合金 磁控溅射 红外光谱 抗腐蚀性 

分 类 号：O484[理学—固体物理]