高管团队背景特征、高管激励与企业R&D投入——来自A股上市高新技术企业的数据分析  被引量:72

Study on Background Characteristics of Top Management Team,Incentive Mechanism and High-tech Enterprise's R&D Investment——Evidence from Listed High-tech Enterprises of A-shares

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作  者:何霞[1,2] 苏晓华[2] 

机构地区:[1]广州番禺职业技术学院,广东广州511483 [2]暨南大学,广东广州510632

出  处:《科技管理研究》2012年第6期100-108,共9页Science and Technology Management Research

基  金:国家自然科学基金青年项目"新创企业模式选择与竞争力研究:基于母体企业资源继承与创新的分析"(70602018);广东省软科学项目"广东先进制造业的战略网络研究"(2010B070300039)

摘  要:以沪深两市105家高新技术上市企业为研究样本,选取衡量高管团队背景特征的六项指标、高管激励的三项指标及企业R&D投入的两项指标,构建高管团队背景特征、高管激励与企业R&D投入的调节效应模型。研究结果表明:(1)高管团队教育程度和专业背景与企业R&D的人力资源投入水平显著正相关;职能背景与企业R&D经费投入水平显著正相关;而高管团队年龄与企业R&D的经费投入水平显著负相关。(2)高管薪酬激励和股权激励正向促进了企业的R&D投入水平。(3)高管股权激励在高管团队年龄和企业R&D经费投入的之间关系上起到了重要的调节作用;高管晋升激励在高管团队性别和企业R&D人力资源投入之间的关系上发挥着重要的调节作用。Taking 105 Chinese listed high- tech enterprises as samples, the thesis selected six indicators to measure top management team' s background characteristics, three indicators to measure incentive mechanism and two indicators to measure R&D investment from these enterprises' 2009 annual reports and other public data. With these indicators and da- ta, the paper constructed an moderating effects model about the relationship between top management team' s background characteristics, incentive mechanism and the R&D investment. The results showed that: (1) education and specialized background had a significant positive influence on the enterprises' R&D investment on human resources ; occupational background had a significant positive influence on the enterprises' R&D investment intensity; age had a significant negative influence on the enterprises' R&D investment intensity. (2) compensation incentive and equity incentive had a positive in- fluence on the enterprises' R&D investment ; (3) equity incentive served as a moderator as the age of top management team and the enterprises' R&D investment intensity, promotion incentive as a moderator as the gender of top management team and the enterprises' R&D investment on human resources.

关 键 词:高管团队 高层梯队理论 TMT背景特征 高管激励 企业R&D投入 

分 类 号:F276.44[经济管理—企业管理] F224[经济管理—国民经济]

 

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