霍尔无栅离子源的研制及应用  

The Development and Application of Hall No Gate Ion Source

作　　者：王稳奇[1] 朱昌[1] 

机构地区：[1]西安工业大学北方信息工程学院,西安710025

出　　处：《表面技术》2012年第2期58-60,共3页Surface Technology

摘　　要：基于离子束辅助镀膜技术,自主研制了一款新型霍尔无栅离子源,利用该离子源,采取离子束辅助沉积方法,在玻璃基底上镀制了多种光学薄膜,并对所镀制光学薄膜的性能进行了测试。测试结果表明:所研制的霍尔无栅离子源制备的各种光学薄膜,其膜层强度、附着性、耐腐蚀性以及光学性质都比常规热蒸发工艺所制得的薄膜有明显改善。Based on ion-beam assisted deposition technique,new type of Hall of independent non-grid ion source was developed,takeing advantage of the ion source,a variety of optical thin films were coated on the glass substrate with ion beam assisted deposition method.By various testing of the optical properties of thin films it shows that the coating strength,adhesion,corrosion resistance and optical properties of the thin films prepared by Hall no gate ion source has significantly improved than prepared by the conventional thermal evaporation process.

关 键 词：霍尔无栅离子源 离子束辅助沉积 光学薄膜 

分 类 号：TG174.444[金属学及工艺—金属表面处理] TB43[金属学及工艺—金属学]