均匀辐照365nm LED光源设计及其在光刻中的应用  

Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography

作　　者：王向贤[1,2] 汪波[1] 傅强[1] 陈漪恺[1] 胡继刚[1] 张斗国[1] 明海[1] 

机构地区：[1]中国科学技术大学光学与光学工程系,安徽合肥230026 [2]巢湖学院物理与电子科学系,安徽巢湖238000

出　　处：《中国激光》2012年第4期214-217,共4页Chinese Journal of Lasers

基　　金：国家973计划(2011CB301802);国家自然科学基金(61177053;11004182);安徽省自然科学基金(11040606Q26);安徽省高等学校省级自然科学研究项目(KJ2012Z272);中国科学技术大学青年创新基金资助课题

摘　　要：优化设计了365nm紫外LED点光源阵列、聚焦透镜组的排布,实现了高强度均匀辐照的LED面光源。利用优化后的365nm LED面光源进行了接触式曝光光刻实验,所得刻写图形与掩模板图形一致。提出的基于365nm紫外LED阵列均匀辐照面光源的光刻方法具有结构简单、节能、环保等优势。Arrangements of point light sources array with 365 nm ultraviolet LED and focusing lens are designed and optimized.Area light source with uniform illumination and high intensity is achieved based on arrangements system.Lithography experiment with contact exposure method is realized with the optimized area optical source.Lithographic patterns are consistent with mask.The lithography method based on uniform area optical source from 365 nm LED arrays has advantages of simple structure,energy conservation and environmental protection.

关 键 词：光学制造 紫外发光二极管 阵列 光刻 

分 类 号：O439[机械工程—光学工程]