预处理对超纳米金刚石薄膜表面质量的影响  

Influence of Pretreatment on Surface Quality of Ultra-nanocrystalline Diamond Thin Films

作　　者：黑立富[1] 刘杰[1] 刘金龙[1] 李成明[1] 宋建华[1] 吕反修[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《人工晶体学报》2012年第2期302-305,共4页Journal of Synthetic Crystals

基　　金：国家自然科学基金资助项目(51102013/E0206)

摘　　要：本文研究了金刚石粉手工研磨及超声波震荡两种预处理方法对硅片衬底及超纳米金刚石膜表面粗糙度和形貌的影响,利用表面轮廓仪、X射线衍射分析(XRD)、激光拉曼、场发射扫描电子显微镜(FE-SEM)对衬底及超纳米金刚石膜进行表征。结果表明,由于衬底轮廓的遗传特性,手工研磨的硅片上沉积的超纳米金刚石膜表面粗糙度远高于超声震荡的硅片上沉积的超纳米金刚石膜。The pretreatments of diamond grinding and ultrasonic vibration on the silicon substrate were presented in this article.Substrate and UNCD films were characterized by surface profilometer,XRD,FE-SEM and Raman spectroscopy.The results showed that the surface roughness of ultra-nanocrystalline diamond films on silicon pretreated by diamond grinding was much higher than that by ultrasonically vibrating,because of the genetic characteristics of the substrate profile.

关 键 词：超纳米金刚石 粗糙度 表面质量 遗传特性 

分 类 号：O484[理学—固体物理]