采用原子层沉积技术在管道内壁镀铝膜的分析研究  

Analysis of Aluminum Deposition on Inner Wall of Pipes with Atomic Layer Deposition

作　　者：刘恒[1] 熊玉卿[1] 王济洲[1] 

机构地区：[1]兰州空间技术物理研究所表面工程技术重点实验室,兰州730000

出　　处：《表面技术》2012年第3期47-50,共4页Surface Technology

基　　金：中国空间技术研究院青年创新基金(GY0303)

摘　　要：研究分析了采用原子层沉积技术在大长径比管道内壁镀制铝膜的可行性。首先,建立了管道内壁气体吸附动力学方程,通过分离变量法解吸附动力学方程,计算出反应前驱体在管道内壁达到饱和化学吸附的时间;其次,根据铝晶胞的面心立方结构,计算出每层原子层沉积周期所镀制的铝膜厚度;最后,理论计算能实现正常波导的管道内壁所需要的铝膜最小厚度,得出原子层沉积所要循环的周期数。The feasibility of aluminum deposition on inner wall of waveguide by atomic layer deposition was studied. First, by solving adsorption kinetics equation based on gas on the pipe inner wall, the time for the reactant to reach saturated adsorption on the basis was calculated. Then, according to the aluminum crystal structure, the thickness of each deposition cycle was obtained. Finally, the minimum aluminum thickness and number of atomic layer deposition cycles that can meet electromagnetic requirement of wave guide was calculated.

关 键 词：原子层沉积 管道内壁 波导 铝 

分 类 号：TG174.444[金属学及工艺—金属表面处理]