射频磁控溅射制备CuAlO_2薄膜及性能表征  

Fabrication and properties of CuAlO_2 films by RF magnetron sputtering

作　　者：孙兆奇[1] 汪娴[1] 李俊磊[1] 朱煜东[1] 宋学萍[1] 

机构地区：[1]安徽大学物理与材料科学学院,安徽省信息材料与器件重点实验室,安徽合肥230039

出　　处：《安徽大学学报（自然科学版）》2012年第3期13-18,共6页Journal of Anhui University(Natural Science Edition)

基　　金：国家自然科学基金资助项目(50642038;50872001;51072001);教育部留学回国人员科研专项基金资助项目

摘　　要：利用Al(OH)3和Cu2O高温固相反应烧结制备的靶材,采用射频磁控溅射法,在玻璃基片上制备非晶CuAlO2薄膜.薄膜的表面均匀,颗粒大小约为50 nm,可见光范围内透射率为60%,平均折射率达2.0,直接带隙为3.86 eV.随着在紫外光源下曝光时间的增加,薄膜的接触角从96.3°减小到87.5°,薄膜仍呈现出良好的疏水性.Amorphous CuAlO2 films were prepared targets composed by Al（ OH）3 and Cu20 powders. The about 50 nm, the transmittance of films was 60% for the on glass by RF magnetron sputtering with sintered particle size of CuAlO2 films with smooth surface was visible range with an average thickness of 283.5 nm, the refractive index was about 2.0 and optical band gap was estimated to be 3.86 eV. Water contact angle of films decreased from 96.3° to 87.5° UV as exposure time increased, however, hydrophobicity of the film was still good.

关 键 词：CuAlO2薄膜 磁控溅射 浸润性 

分 类 号：O484[理学—固体物理]