0.6～1.55μm可见/近红外超宽带增透膜的研制  

Design and fabrication of 0.6-1.55 μm visible/near infrared ultra-broad band antireflection coatings

作　　者：杨道奇[1] 付秀华[1] 耿似玉[1] 杨永亮[1] 潘永刚[1] 

机构地区：[1]长春理工大学光电工程学院,吉林长春130022

出　　处：《中国光学》2012年第3期270-276,共7页Chinese Optics

基　　金：广东省教育部产学研结合资助项目(No.2010B090400048)

摘　　要：针对可见/近红外宽谱段光谱仪探测器窗口的使用要求,选择TiO2、M1和SiO2分别作为高、中、低折射率镀膜材料,通过不同方案对膜系进行了优化设计和比较。采用电子束蒸发兼离子束辅助沉积技术,通过不断调整工艺参数,得到了光学性能优良、制备重复性好、牢固度强且致密的可见近红外宽带增透膜。该增透膜在(650±10)nm、900～1 100 nm和(1470±10)nm三波段内平均透过率≥99%,在620～1 550 nm宽波段内整体平均透射率≥97%,满足了光谱仪探测器窗口的实际使用要求。As for the operating requirements of spectrometer detector windows operating from visible to the infrared spectrum,the TiO2,M1 and SiO2 were chosen as coating materials with different refractive indexes and were designed into film stacks by various schemes.By using electron beam evaporation with ion beam assist deposition,the visible/near infrared ultra-broad band antireflective coatings with excellent optical properties,good repetition and firmness were prepared by parameter adjustment.The average transmittances of these coatings are better than 99% at（650±10） nm,900-1 100 nm and（1 470±10） nm,and better than 97% in 620-1 550 nm as a whole.It meets the actual requirements of the spectrometer detector windows well.

关 键 词：光学薄膜 宽带增透膜 电子束蒸发 离子束辅助沉积 

分 类 号：O484.4[理学—固体物理]