含氟紫外纳米压印光刻胶的研制  

Research on Fluorine-Contained UV-Nanoimprint Resist

作　　者：赵彬[1] 周伟民 张静 刘彦伯 王金合 张燕萍 施利毅[1] 张剑平[1] 

机构地区：[1]上海大学理学院化学系,上海200444 [2]上海市纳米科技与产业发展促进中心纳米核心技术实验室,上海200237

出　　处：《微纳电子技术》2012年第7期471-477,共7页Micronanoelectronic Technology

基　　金：上海市科委纳米专项基金资助项目(1052nm07500)

摘　　要：从主体树脂性质、光引发剂的选择、助剂的选择、溶剂的设计等多个方面论述了含氟纳米压印光刻胶的研制工艺。在纯有机材料为主体的光刻胶中引入了全氟丙烯酸酯助剂,解释了含氟助剂在光刻胶中的作用。使用接触角法评估了全氟丙烯酸酯对光刻胶表面性质的影响,并通过接触角数据预测了光刻胶的脱模能力。通过旋涂、压印、刻蚀等实验验证了光刻胶的性能,并通过实验数据筛选出了最佳配方。研制出的光刻胶样品图形保真度高、分辨率好,对底材有良好的黏附力,且具有良好的脱模能力。The development process of the fluorine-contained UV-nanoimprint resist was discussed in the way of the main polymer property,the choice of the photoinitiator and additive,and the design of the solvent.The perfluoro acrylate as the additive was added in the resist with pure organic materials as the main body and its function in the resist was explained.The effect of the perfluoro acrylate on the surface property of the resist film was evaluated by contact angle method and the demolding ability of the resist was assessed with the data of the contact angle.The performances of the resist were verified by using the spin coating,imprinting,etching experiments and the best formula was chosen with the experimental data.The resist sample has high resolution,good fidelity pattern,strong adhesion to substrates and good demolding ability.

关 键 词：紫外纳米压印 光刻胶 含氟助剂 接触角 脱模 

分 类 号：TQ577.35[化学工程—精细化工]