CVD温度对钽涂层组成、显微组织及形貌的影响  

Effect of Chemical Vapor Deposition Temperature on Composition,Microstructure and Surface Morphology of Tantalum Coatings

作　　者：蔡宏中[1] 魏巧灵[1] 陈力[1] 王云[1] 胡昌义[1] 

机构地区：[1]稀贵金属综合利用新技术国家重点实验室,昆明贵金属研究所,云南昆明650106

出　　处：《稀有金属》2012年第4期563-567,共5页Chinese Journal of Rare Metals

基　　金：国家自然科学基金资助项目(50171031);云南省自然科学基金资助项目(2010zc251)

摘　　要：利用TaCl2-H2-HCl反应体系,采用冷壁式化学气相沉积法(CVD)在钼基体表面沉积钽涂层。通过X射线衍射仪、金像显微镜及扫描电镜等手段,对不同沉积温度下钽涂层的组成、组织及形貌进行了研究。结果表明:在1000～1300℃范围内,钽沉积层的相组成无变化,而对择优生长有一定影响;钽沉积层晶粒尺寸随沉积温度的升高而增大;钽沉积层表面颗粒呈金字塔形多面体且随沉积温度的升高而增大。The Ta coating on the surface of Mo matrix was prepared by cold-wall CVD in TaC12-H2-HC1 system. The influences of temperature on phase composition, mierostructures and surface morphology of the coating were studied. The results showed that within 1000℃ 1300℃, with the increase of temperature, although grain size increased, there was no obvious change on the phase composition of tantalum coating; the Ta crystals were polyhedral pyramid and increased with the temperature.

关 键 词：化学气相沉积 钽涂层 相组成 显微组织 形貌 

分 类 号：TG146.416[一般工业技术—材料科学与工程]