半导体光电薄膜的分析和检测  

Analysis and Inspection of Semiconductor Optoelectronic Films

作　　者：罗江财[1] 

机构地区：[1]重庆光电技术研究所,重庆400060

出　　处：《半导体光电》2000年第A03期81-83,共3页Semiconductor Optoelectronics

摘　　要：半导体光电薄膜的制备 ,是半导体光电器件最重要和最基本的工艺过程。半导体光电薄膜的分析和检测是器件开发中必须首先要解决的重要问题之一。文章介绍了半导体光电薄膜的分析和检测以及分析技术和仪器设备的发展现状。The preparation of semiconductor optoelectronic films is the most important and basic processing for semiconductor optoelectronic devices.The subject of analysis and inspection of semiconductor optoelectronic film is one of the most important problems for device development.In this paper,recent advances in analysis and inspection of the films are briefly described as well as the corresponding instruments of the films.

关 键 词：半导体薄膜 检测 光电薄膜 

分 类 号：TN304.055[电子电信—物理电子学] TN304.07