低原子序数材料窄带多层膜的研制  

Narrowband multilayer with low Z materials

作　　者：吴文娟[1] 朱京涛[2] 张众[2] 王风丽[2] 陈玲燕[2] 周洪军[3] 霍同林[3] 

机构地区：[1]上海应用技术学院理学院,上海201418 [2]同济大学精密光学工程技术研究所,上海200092 [3]中国科学技术大学国家同步辐射实验室,合肥230029

出　　处：《强激光与粒子束》2012年第8期1785-1788,共4页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(10905042)

摘　　要：为研制极紫外波段窄带多层膜反射镜,采用低原子序数材料组合设计了30.4 nm波长处Mg/SiC,Si/SiC,Si/B4C和Si/C多层膜反射镜,并与极紫外波段传统的Mo/Si多层膜反射镜进行对比。采用直流磁控溅射技术制备了这些多层膜,在国家同步辐射实验室辐射与计量光束线完成了多层膜反射率测量,测量结果表明:Mg/SiC多层膜的带宽最小,为1.44 nm,且反射率最高,为44%;而Mo/Si多层膜的反射率仅为24%,带宽为3.11 nm。实验结果证明了采用低原子序数材料组成的多层膜的带宽要比常规多层膜窄,该方法可以应用于极紫外波段高分辨研究。Mo/Si multilayer are normally used in the early extreme ultraviolet（EUV） astronomical observation.In recent years people want to get observations in higher spectral resolution.Multilayer with low-Z materials have been studied.Four kinds of multilayer,Mg/SiC,Si/SiC,Si/B4C and Si/C multilayer were designed at the wavelength of 30.4 nm and compared with the normal Mo/Si multilayer.All the multilayer were prepared with DC magnetron sputtering,and their reflectivities were measured by synchrotron radiation.The results show that the bandwidth of Mg/SiC multilayer is 1.44 nm,which is the smallest,and the reflectivity is 44%,which is the highest.While the reflectivity of Mo/Si multilayer is only 24% and the bandwidth is 3.11 nm.The bandwidths of multilayer of low-Z materials are narrower than that of the normal multilayer.Therefore,multilayer of low-Z materials can be used in the EUV high spectral resolution field.

关 键 词：多层膜 带宽 低原子序数材料 磁控溅射 同步辐射 

分 类 号：O434[机械工程—光学工程] O484[理学—光学]