磁控溅射法沉积TCO薄膜的电源技术  

The Development of Power Sources for Magnetron Sputtering TCO Thin Films

作　　者：陈宇 李民英 

机构地区：[1]广东志成冠军集团有限公司

出　　处：《电源世界》2012年第7期21-25,共5页The World of Power Supply

摘　　要：电源在磁控溅射法制备透明导电氧化物(TCO)薄膜的技术中起着重要的作用。本文重点介绍了磁控溅射TCO薄膜的电源技术发展现状及进展,首先简要说明了目前应用最广泛的直流电源技术及具备灭弧能力的脉冲电源技术的原理和主要优缺点。进一步的,介绍了具备快速灭弧补偿功能的新型直流电源技术和模块化电源技术。最后进一步分析了代表新一代技术的高功率脉冲磁控溅射(HPPMS)电源的基本原理和优良特性,并指出其发展所面临的挑战。The power source play an important role for magnetron sputtering of the transparent conductive oxides （TCO）. This paper introduces the conventional DC power source and pulsed power source for magnetron sputtering of the TCO at first. Then the newly developed modular power source and the DC power source with a fast arc elimination function and an arc compensation technology are introduced. Furthermore, the principle, characteristic and challenge of high power pulsed magnetron sputtering （HPPMS）power source which is regarded as the new generation power source of magnetron sputtering is discussed.

关 键 词：TCO薄膜 磁控溅射 电源 HPPMS 

分 类 号：TN86[电子电信—信息与通信工程]