磁控溅射辉光放电特性的模拟研究  

Computer simulation of the glow discharge characteristics in magnetron sputtering

作　　者：沈向前[1] 谢泉[1] 肖清泉[1] 陈茜[1] 丰云[1] 

机构地区：[1]贵州大学理学院新型光电子材料与技术研究所,贵阳550025

出　　处：《物理学报》2012年第16期316-321,共6页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:60766002);科技部国际合作专项基金(批准号:2008DFA52210);贵州省科技攻关项目(批准号:黔科合GY字[2011]13015);贵州省科技创新人才团队建设专项基金(批准号:黔科合人才团队[2011]4002);贵州省国际科技合作项目(批准号:黔科合外G字[2012]7004;黔科合外G字[2009]700113)资助的课题~~

摘　　要：采用二维、自洽的PIC/MCC(particle-in-cell with Monte Carlo collision)方法,模拟了磁控溅射辉光放电过程,重点讨论了工作参数对放电模式和放电电流的影响.模拟结果表明,当工作气压由小到大或空间磁场从强到弱变化时,放电模式会从阴极空间电荷主导的放电模式过渡到阳极空间电荷主导的放电模式.在过渡状态,对应的工作气压与磁通密度分别为0.67 Pa和0.05 T;随着工作气压的增大,放电电流先增大后趋向平衡,当工作气压超过2.5 Pa时,电流开始随工作气压的增大而减小;而阴极电压增大时,放电电流近似线性增加.In this paper, the process of glow discharge in magnetron sputtering is studied by the particle-in-cell with Monte Carlo collision method. The proposed model is a two-dimensional and self-consistent approach. The results show that the discharge mode transits from the negative space-charge-dominated mode to positive space-charge-dominated mode with working pressure increasing or magnetic field weakening. At the transition state, working pressure and magnetic field are 0.67 Pa and 0.05 T, respectively. Discharge current increases as the cathode voltage increases. When pressure increases, discharge current first increases and then tends to balance. When the pressure is higher than 2.5 Pa, current begins to decreases with the increase of the pressure.

关 键 词：磁控溅射 辉光放电 计算机模拟 状态分布 

分 类 号：O461.21[理学—电子物理学]