蒙特卡罗方法数值模拟二维原子光刻  

Numerical Simulation of 2D Atom Lithography via Monte Carlo Method

作　　者：张萍萍[1] 马艳[1] 李同保[1] 

机构地区：[1]同济大学物理系,上海200092

出　　处：《同济大学学报（自然科学版）》2012年第8期1270-1275,共6页Journal of Tongji University:Natural Science

基　　金：国家自然科学基金(10804084)

摘　　要：间距为半波长的纳米点制作可以进一步推动纳米计量的发展.基于经典粒子光学模型,采用蒙特卡罗思想提供初始条件,数值分析了偏振方向平行于光场平面、正交激光驻波场形成的光格点的汇聚与沉积特性.针对不同激光功率以及横向发散角分析了沉积纳米点的三维结构,同时也讨论了基板摆放位置对沉积结构的影响.数值模拟结果表明,在厚透镜及沟道化情况下得到了特征较好的纳米点.横向发散角以及基板位置的摆放是影响纳米点质量的重要因素.The fabrication of nanodots spaced by half the wavelength can furthur put forward the development of nanoscale length transfer standard. Focusing and deposition characteristics of quadratic optical lattice formed by two orthogonal standing waves with parallel polarization were numerically analyzed via particle optics model. The initial condition was selected stochastically. Three dimensional（3D） structures of nanodots were studied under different laser power and transverse Gaussian divergence. The effects on nanodots with different deposition positions were also discussed. Numerical simulation shows that the results with better characterics can be obtained in immersion lens and channeling regime. Transverse angular distribution and the deposition position dominantly determine the quality of the nanodots.

关 键 词：激光光学 原子光刻 纳米计量 纳米点 蒙特卡罗方法 

分 类 号：O436[机械工程—光学工程]