硫化锌窗口上CVD法制备金刚石膜的研究进展  

THE LATEST DEVELOPMENT OF DIAMOND DEPOSITION ON ZINC SULFIDE BY CVD

作　　者：吕继磊[1] 满卫东[1] 朱金凤[1] 涂昕[1] 

机构地区：[1]武汉工程大学湖北省等离子体化学与新材料重点实验室,武汉430073

出　　处：《真空与低温》2012年第2期107-114,共8页Vacuum and Cryogenics

基　　金：湖北省自然科学基金11104211

摘　　要：金刚石具有优异的红外透过性能,可作为硫化锌红外窗口的保护膜。但由于CVD金刚石的沉积过程会刻蚀硫化锌衬底,导致在窗口表面直接生长金刚石膜比较困难。本文主要综述了近年来通过添加过渡层沉积金刚石薄膜的方法和光学焊接金刚石厚膜的方法来增强硫化锌窗口的性能,并介绍了CVD金刚石膜的光学应用及其目前所存在的问题,最后对未来CVD金刚石膜发展的方向作出了展望。Diamond films can be used as infrared-transmittance protective coatings on ZnS due to its excellent properties. However, direct deposition of diamond films on ZnS by chemical vapor deposition has been proved to be impossible. The methods of adding interlayer to deposit diamond film and optical brazing technique for bonding diamond films to zinc sulfide for improving the properties of the ZnS window were reviewed in this paper. And the optical application and the difficulties of the CVD diamond were introduced. Finally, the future direction of CVD diamond film development was presented.

关 键 词：金刚石膜 硫化锌 红外 光学窗口 

分 类 号：O484[理学—固体物理]