光刻机照明系统中光束稳定技术研究  

Study on Beam Stabilization Technique in Lithography Illumination System

作　　者：鲍建飞[1,2] 黄立华[1] 曾爱军[1] 任冰强[1] 杨宝喜[1] 彭雪峰[1] 胡小邦[1] 黄惠杰[1] 

机构地区：[1]中国科学院上海光学精密机械研究所信息光学与光电技术实验室,上海201800 [2]中国科学院研究生院,北京100049

出　　处：《中国激光》2012年第9期146-152,共7页Chinese Journal of Lasers

基　　金：科技部国际科技合作项目(2011DFR10010)资助课题

摘　　要：光束稳定技术是光刻机照明系统中一项重要的单元技术,其作用是将激光器出射的经长距离传输后的光束稳定在需要的指向和位置上,以保证照明系统具有稳定的光强分布。光束稳定系统主要由光束测量和光束转向两个功能模块组成,推导了两个模块之间的光束传递矩阵,并基于LabView搭建了光电闭环控制实验系统。对系统性能进行了测试,通过人为引入已知光束漂移量得到如下结果:系统的指向稳态误差低于±3μrad,位置稳态误差低于±0.04mm,系统调整时间小于80ms。结果表明该系统可以精确地把光束稳定在需要的指向和位置。Beam stabilization technique is one of the most important techniques in modern lithography illumination system.It provides a stable light intensity distribution for the illumination system by stabilizing the pointing and position of laser beam transmitting a long distance.Beam stabilization system is composed of a beam measurement functional module and a beam steering functional module.The beam transfer matrix between two modules is deduced and an optoelectronic closed-loop control experimental system is built based on LabView.Performances of the system are tested by importing given beam drifting.The system pointing steady-state error is obtained to be better than ±3 μrad,the position steady-state error is better than ±0.04 mm,and the adjustment time is less than 80 ms.These results prove that the system can accurately stabilize the beam to specified pointing and position.

关 键 词：光学设计 光刻技术 光束稳定 闭环控制 光束测量 

分 类 号：TN247[电子电信—物理电子学] O435.1[机械工程—光学工程]