旋转圆柱靶磁控溅射阴极的磁场模拟及结构设计  

Structure Design of Cylindrical Rotating Magnetron Sputtering Cathode and Simulation of Its Magnetic Field

作　　者：陈长琦[1] 穆怀普[1] 刘腾飞[1] 裘一冰[1] 

机构地区：[1]合肥工业大学真空科学技术与装备研究所,合肥230009

出　　处：《真空科学与技术学报》2012年第10期913-918,共6页Chinese Journal of Vacuum Science and Technology

摘　　要：基于旋转圆柱靶磁控溅射阴极的工作原理,建立其结构模型,并应用ANSYS有限元方法对旋转靶阴极磁场进行了模拟计算,得到了磁场分量Bx在靶材表面上的二维磁场分布规律。通过调节磁铁的宽和高、磁铁间夹角以及设置可移动磁性挡板等方法优化磁场并设计了一种新型磁场结构旋转靶。本研究为旋转靶磁控溅射阴极的磁场结构设计提供了理论依据。The structure of the cylindrical rotating magnetron sputtering cathode and its magnetic field distribution were modeled, designed, and simulated in finite element method with software package ANSYS. The 2D distribution of the Bx component of the magnetic field on the target surfaces was evaluated in the simulation. Guided by the simulated re- sults, the optimized magnetic field distribution was obtained by adjusting the geometry and alignment angles of the permanent magnets involved, and by installing the mobile magnetism baffle plates between the magnets and the target. Moreover, a novel type of the cylindrical rotating magnetron sputtering cathode, to be used in the thin film growth on industrial scale, was designed.

关 键 词：磁控溅射 旋转靶阴极 磁场模拟 结构设计 

分 类 号：TB43[一般工业技术]