超声技术在半导体行业中应用探讨  

The Discussing of Ultrasonic Technique Application In Semiconductor Industry

作　　者：宋伟峰[1] 成龙[1] 刘永进[1] 关宏武[1] 

机构地区：[1]中国电子科技集团公司第四十五研究所,北京101601

出　　处：《电子工业专用设备》2012年第10期4-5,20,共3页Equipment for Electronic Products Manufacturing

摘　　要：晶片的洁净程度直接决定了晶片的价值,而晶片最前端工艺就是清洗。现代化超声技术的应用可让晶片更洁净。超声波清洗的功率、频率、尺寸、安装方式的选择都与晶片清洁程度有着密切关系。主要对超声波的原理和频率的选定进行了介绍。Wafer clean degree directly determines the value of. While the front end is the cleaning wafer process. Let the wafer cleaning cleaner, has been engaged in cleaning industry personnel problem. Modem ultrasound technology applications for this problem has been solved very well. Ultrasonic cleaning power, frequency, size, installation mode choice and wafer cleaning degree is closely related to. Mainly on the principle of ultrasonic wave and frequency selection are introduced.

关 键 词：超声波 兆声波 清洗 

分 类 号：TN305.97[电子电信—物理电子学]