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作 者:徐慧鑫[1] 赵文宏[1] 陈晨[1] 周芬芬[1] 程城远[1]
机构地区:[1]浙江工业大学机械工程学院,浙江杭州310032
出 处:《机电工程》2012年第11期1255-1258,共4页Journal of Mechanical & Electrical Engineering
摘 要:振动是影响超精密加工质量的关键因素之一,弹簧加压式双面抛光机在抛光过程中的上研磨盘振动现象严重制约了产品的加工精度。为解决这一问题,提出了在弹簧加压装置中加入磁流变阻尼器的方法,通过控制磁流变阻尼器阻尼系数来实现对双面抛光和上研磨盘振动的半主动控制,以达到抑制振动的效果。首先,对改进后的压力加载系统进行了数学建模,得到了抛光过程中上研磨盘的运动方程式;接着,对半主动控制的控制策略进行了设计,得到了其控制算法;最后,在Simulink中对半主动控制策略下的系统进行了仿真分析,并将其仿真结果与未加控制时的系统仿真结果进行了比较分析。比较分析结果表明,所设计的半主动控制方法能够有效抑制双面抛光机上研磨盘的振动现象。Vibration is one of the main factors of influencing the processing quality in uhra-precision machining. The top lap's vibration in the double sided polishing machine which used spring-weighted equipment during the process of polishing declines the processing quality seriously. In order to solve this problem, a method of semi-active control in the top lap's vibration was investigated. In detail, a magneto rheological damper was added into the spring-weighted equipment, and the damping of magneto rheological damper was controlled at real time. In this way, vibration could be inhibited. Firstly, the mathematical model of the pressure loading system was established. At the mathematical model, the top lap's motion equation during the process of polishing could be gotten. Next, the control strategy of the semi-active control was presented. At the control strategy, the control algorithm was given. In the end, the simulation of the system under semi-active control was evaluated in Simulink. The other results were compared with the other results under uncontrolled. The comparison results indicate that by the way of the semi-active control method presented, the top lap's vibration can be inhibited efficiently.
关 键 词:双面抛光机 上研磨盘 振动抑制 磁流变阻尼器 半主动控制
分 类 号:TG356.28[金属学及工艺—金属压力加工] TH39[机械工程—机械制造及自动化]
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