偏压对硅掺杂类金刚石碳膜力学及摩擦学性能的影响  

Effect of DC Negative Bias on the Structure and Tribological Properties of Silicon Containing Diamond-like Carbon Films

作　　者：杨保平[1] 郑愉[1,2] 张斌[2] 张俊彦[2] 

机构地区：[1]兰州理工大学石油化工学院,甘肃兰州730050 [2]中国科学院兰州化学物理研究所固体润滑国家重点实验室,甘肃兰州730000

出　　处：《摩擦学学报》2012年第6期634-640,共7页Tribology

基　　金：国家自然科学基金项目(50823008,50975273)资助~~

摘　　要：通过磁控溅射沉积过程中,硅靶表面中毒制备表面微量硅掺杂类金刚石薄膜,并改变沉积偏压制备出不同结构及性能的含硅类金刚石薄膜.利用XPS、拉曼光谱仪、SEM、纳米压痕仪和摩擦磨损试验机等手段表征含硅类金刚石薄膜的结构、横截面形貌、力学性能及摩擦学性能.结果表明:偏压为-600 V下沉积Si-DLC薄膜具有致密结构,高结合力,高硬度的特性,在大气环境下,薄膜与Al2O3陶瓷球对摩表现出优良的摩擦学性能,摩擦系数与磨损率分别为0.018和1.60×10-16 m3/(N.m).Due to the deposition of C on Si target during the deposition process, we can use this target poisoning phenomenon to deposit DLC film with trace or low Si, the Si - DLC films with different structures were prepared via different negative bias application. The structure, cross - sections, composition, mechanical and tribological properties of the films was systemically investigated by XPS, Raman spectra, scanning electron microscopy, nano - indenter and tribo - tester. The results show that the content of sp3 hybrid carbon was increased as the Si doped, and Si - doping could release the internal stress and increase adhesion to silicon substrate. The Si - DLC film prepared at bias of - 600 V exhibited higher hardness, higher adhesion, lower friction coefficient about 0. 018 and lower wear rate about 1.60 x 10 -16 m3/（ N . m） in the ambient atmosphere.

关 键 词：偏压 磁控溅射 Si-DLC 摩擦学性能 

分 类 号：TH117.3[机械工程—机械设计及理论]