氮气含量对反应射频磁控溅射制备CrN_x薄膜组织与性能的影响  

Impact of Nitrogen Content on the Structure and Properties of Reactive RF Magnetron Sputtering CrN_x Films

作　　者：陈勇[1] 李晖[1] 许洪斌[1] 王松[1] 

机构地区：[1]重庆理工大学材料科学与工程学院,重庆400054

出　　处：《重庆理工大学学报（自然科学）》2012年第12期21-25,共5页Journal of Chongqing University of Technology：Natural Science

基　　金：国家自然科学基金资助项目(51275548);重庆市自然科学基金资助项目(CSTC2012jiB70002)

摘　　要：采用反应射频磁控溅射法在40Cr基体上制备CrNx薄膜,研究了不同氮气含量对薄膜组织形貌、粗糙度、沉积厚度以及纳米硬度和弹性模量的影响。结果表明:采用反应射频磁控溅射法在不同氮气含量下,可制备得到厚度均匀、表面质量好的CrNx薄膜;随着氮气含量的增加,薄膜的表面光洁度先逐渐增大,氮气含量为20%时光洁度值最大为0.024μm,之后光洁度缓慢下降;薄膜的沉积厚度也随着氮气含量的增加而先增大后减小,氮气含量分别为20%和50%,薄膜厚度出现最大值8.7μm和最小值2.1μm;随着氮气含量的变化,当含量为20%时纳米硬度最大值为30.9 GPa,弹性模量为422.6 GPa。CrNx films were deposited on 40Cr steel with varying nitrogen content,using reactive RF（radio frequency） magnetron sputtering.The structure topography,roughness and thickness,as well as nano-hardness,Young＇s modulus were investigated.Results showed that CrNx films prepared by reactive RF magnetron sputtering in different nitrogen content of uniform thickness and smooth surface.The roughness of the film increased gradually with increasing nitrogen,the maximum roughness being 0.024 μm with the nitrogen content of 20%,and the roughness descended slowly with increasing nitrogen.The thickness of films increased and then descended with the range of nitrogen content from 0% to 50%,the Maximum and Minimum thickness being 8.7 μm and 2.1 μm,respectively.The hardness changed with varying nitrogen,and the Maximum nano-hardness 30.9 GPa and Young＇s modulus 422.6 GPa were obtained with 20% nitrogen content.

关 键 词：反应射频磁控溅射 CRNX薄膜 氮气含量 纳米硬度 弹性模量 

分 类 号：TG174.453[金属学及工艺—金属表面处理]