任意形状图形的灰度掩模图的设计系统研究  

Gray-Scale Mask Design System of Arbitrary Shaped Pattern

作　　者：杜立群[1,2] 冼宗明[2] 王大志[1] 

机构地区：[1]大连理工大学精密与特种加工教育部重点实验室,大连116024 [2]大连理工大学微纳米技术及系统辽宁省重点实验室,大连116024

出　　处：《纳米技术与精密工程》2013年第2期152-158,共7页Nanotechnology and Precision Engineering

基　　金：国家自然科学基金资助项目(51075057;50675025;50905027)

摘　　要：灰度掩模技术是制作三维微纳结构的有效方法之一,灰度掩模图设计是灰度掩模技术的重要组成部分.目前,在微机械器件制作领域中,通常只给出常用规则形状三维结构对应的灰度掩模图的设计方法,对于任意形状图形的灰度掩模图设计鲜有报道.本文综合灰度光刻技术中的编码原理和有限元法中的铺路法,提出了适合于任意形状图形的灰度掩模图设计算法,解决了误差处理和图形闭合两个关键问题,给出了算法及图形的评价方法,并利用AutoCAD二次开发工具ObjectARX研究了算法的程序实现,构建了灰度掩模图的设计系统.利用该系统设计了多幅常规规则形状和任意形状灰度掩模图,结果表明,该系统可以高效地设计任意形状图形的灰度掩模.研究工作为任意形状图形灰度掩模图的设计提供了一种新方法,可以提高灰度掩模图的设计效率,为三维微纳器件的制作提供技术积累.Gray-scale mask technology is one of the most effective methods to fabricate three- dimensional micro/nano-structures in micro electro mechanical system. The gray-scale mask design is the key of gray-scale mask technology. However, the existing methods for gray-scale mask design arc just applied to the specific regular patterns. In this paper, based on the coding theory in gray-scale lithography and the paving method in finite element analysis, a novel algorithm used for gray-scale mask design of arbitrary shaped pattern was proposed. The key problems of pattern closure and patterns and arbitrary shaped the algorithm is applied to patterns were accomplished through the program. The results indicate that designing gray-scale mask with arbitrary shaped pattern efficiently. The method presented in this paper possesses the advantage of simple design program, and provides technology accumulation for the fabrication of three-dimensional micro/nano-structures.

关 键 词：灰度掩模 设计算法 铺路法 任意形状图形 OBJECTARX 

分 类 号：TP211.4[自动化与计算机技术—检测技术与自动化装置] TP311.52[自动化与计算机技术—控制科学与工程]