石墨烯微纳结构加工技术的研究进展  

Research Progress of the Process Technology for Graphene Micro/Nano Structures

作　　者：李艳[1] 张芳[1] 陈辉[1] 刘智波[2,3] 代克杰[1] 

机构地区：[1]平顶山学院电气信息工程学院高压智能开关工程技术研究中心,河南平顶山467000 [2]南开大学物理科学学院,天津300071 [3]南开大学泰达应用物理学院弱光非线性光子学教育部重点实验室,天津300071

出　　处：《微纳电子技术》2013年第4期255-263,共9页Micronanoelectronic Technology

基　　金：河南省高校科技创新人才支持计划(2012HASTIT034);平高电气博士后基金资助项目(PJH/JK17-2011)

摘　　要：简单介绍了石墨烯独特的光电子性质,说明实现其在光电子器件中应用的有效方法是进行微纳加工。接下来对主要的石墨烯微纳加工技术——掩膜光刻、转移压印以及激光直写和干涉进行详细阐述,通过实例对每种加工技术的关键步骤和特点进行说明,并分析比较了不同加工技术的优缺点。然后对近期出现的转移压印辅助光刻和飞秒直写辅助转移压印技术的加工流程进行详细介绍,阐述将两种加工技术相结合应用于石墨烯微纳结构加工的优势。最后,简单展望了石墨烯微纳加工未来的发展趋势,指出需进一步研究的问题,对如何更好地实现石墨烯微纳结构的加工提出一些建议。The unique optoelectronic properties of the graphene are introduced briefly, which il-lustrate that the micro/nano processing is the effective method to realize the graphene applied to the electronic and optoelectronic devices. Then, the main techniques of the graphene micro/nanoprocessing are elaborated, including the mask lithography, transfer printing, laser direct writing and interference. The key steps and characteristics of each process technology are explained byexamples, and the advantages and disadvantages of different techniques are analyzed. The process flows of the transfer printing-assisted lithography and femtosecond laser direct writing-assistedtransfer printing are introduced in detail, the advantages of combining two different techniques applied to the graphene micro/nano structure processing are expounded. Finally, the future development trend of the graphene micro/nano processing is prospected, the problems which have to be further studied are pointed out, and some suggestions on how to obtain the better graphene- based micro/nano structures are presented.

关 键 词：石墨烯 微纳加工 光刻 转移压印 直写 干涉 

分 类 号：TB383[一般工业技术—材料科学与工程] TN305.2[电子电信—物理电子学]