利用脉冲激基分子激光制备大尺寸类金刚石薄膜及其均匀性分析  

PULSED LASER DEPOSITION OF DLC FILMS OVER LARGE AREA AND IT'S UNIFORMITY

作　　者：李铁军[1,2] 刘晶儒[1] 王丽戈[1] 楼祺洪[3] 

机构地区：[1]西北核技术研究所 [2]中国科学院上海光学精密机械研究所,上海800-216信箱,201800 [3]中国科学院上海光学精密机械研究所

出　　处：《光子学报》1999年第12期1080-1085,共6页Acta Photonica Sinica

基　　金：863 计划资助

摘　　要：利用脉冲激光沉积结合计算机辅助衬底扫描技术制备了尺寸为７０ ×６６ｍ ｍ 、均匀性为±５ ％ 的类金刚石薄膜，薄膜显微硬度最高为２７ＧＰａ ，薄膜结合强度达到２００００ 转；在制备大尺寸薄膜的过程中，衬底扫描速度越慢，薄膜的均匀性越好；在应用传统清洗等方法的基础上，认为增大镀膜粒子的能量对于提高薄膜和衬底的结合强度是非常重要的－In this work,large area uniform hydrogen free DLC films have been deposited at room temperature by krf pulsed laser ablation with computer aidded substrate scanning under high vacuum condition.The films exhibited a thickness variation less than±5%within the area of 70×66mm.Properties of the film obtained have been analyzed.In discussion,scanning speed of the substrate is believed to be the most important factor with the uniformity of the film.As for adhesion strength of DLC films,the energy of the particles deposited on the substrate is supposed to be the most important factor in addition to routine treatment.

关 键 词：类金刚石薄膜 脉冲激光沉积 均匀性 

分 类 号：O484.1[理学—固体物理]