抛光介质对固结磨料化学机械抛光水晶的影响  

Effect of slurries on chemical mechanical polishing of decorative glasses by fixed-abrasive pad

作　　者：居志兰[1,2] 朱永伟[1] 王建彬[1] 樊吉龙[1] 李军 

机构地区：[1]南京航空航天大学机电学院江苏省精密与微细制造技术重点实验室,江苏南京210016 [2]南通大学机械工程学院,江苏南通226019

出　　处：《光学精密工程》2013年第4期955-962,共8页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(No.51175260);江苏省自然科学基金资助项目(No.BK2010516);中央高校基本科研业务费专项资金资助项目(No.NP2012516);江苏省高校优势学科建设工程资助项目

摘　　要：在固结磨料化学机械抛光中,工件表面与抛光介质易发生水解反应,产生软化层,而软化层厚度直接影响材料去除速率及表面质量。本文采用显微硬度计测量了不同介质条件下水晶表面的变质层厚度,并基于CP-4研磨抛光平台研究了不同抛光介质及温度对材料去除速率的影响,进而在线测量了抛光过程中声发射信号及抛光垫与工件之间摩擦系数的变化。结果表明:六偏磷酸钠的加入可促进水晶玻璃表层网络结构断裂,软化表层,软化层厚度随着浸泡时间、温度升高而增加,进而提高了水晶玻璃的去除率;而且随着温度升高,水解作用更加明显。实验显示,声发射信号及摩擦系数实时测量对抛光工艺参数的优化具有指导意义。In chemical mechanical polishing by a fixed-abrasive pad, the hydrolysis between workpiece and slurries will form a softened layer on the glass substrate to effect on the Material Removal Rate （MRR） and surface quality. The influence of polishing slurries on the surface hardness of decorative glass is analyzed by the micro-hardness method in this paper. The effects of different slurries and tem- peratures on the MRR were investigated using a CP-4 lapping and polishing platform. Both the dy- namic Acoustic Emission （AE） and Coefficient of Friction （COF） were continuously monitored in-situ during the polishing process. The results show that the network structure on the decorative glass sur- face is collapsed when the sodium hexametaphosphate was added to the slurries, and this layer is softer than the glass, which improved the material removal rate. With the temperature increased, the hydrolysis effect is more obviously. Direct real-time monitoring of AE and COF can offer constructive significance for optimizing process parameters of polishing.

关 键 词：抛光介质 固结磨料 化学机械抛光 软化层 显微硬度 材料去除速率 

分 类 号：TN305.2[电子电信—物理电子学] TG74[金属学及工艺—刀具与模具]