原子层沉积氧化铝薄膜摩擦学性能研究  

Tribological Properties of Alumina Films Fabricated by Atomic Layer Deposition

作　　者：王莹[1,2] 杨静[1,2] 袁宁一[1,2] 丁建宁[1,2] 夏丽[1,2] 谭成邦[1,2] 

机构地区：[1]常州大学低维材料微纳器件与系统研究中心,江苏常州213164 [2]常州大学太阳能电池材料与技术江苏省重点实验室,江苏常州213164

出　　处：《摩擦学学报》2013年第2期177-183,共7页Tribology

基　　金：国家自然科学基金(NSFC 51102028);固体润滑国家重点实验室开放基金(1006);江苏省高校优势学科建设项目资助~~

摘　　要：不同温度条件下,采用原子层沉积(ALD)技术在单晶硅基底表面制备了Al2O3薄膜.利用原子力显微镜观察了Al2O3薄膜的表面形貌和粗糙度,利用纳米压痕仪测定了薄膜的硬度,并通过UMT-2型往复摩擦磨损试验机(球-盘接触方式)考察了制备温度、载荷和对偶球对Al2O3薄膜的摩擦学性能的影响.结果表明:不同温度条件下制备得到的Al2O3薄膜的粗糙度不同;制备温度为100和200°C的Al2O3薄膜的摩擦性能较优;在所用载荷范围内,摩擦系数存在最低值;与不同对偶球对摩时,由于对偶球硬度不同,Al2O3薄膜呈现不同的摩擦磨损现象.Alumina films were deposited on silicon substrates at different temperatures using atomic layer deposition.The morphology of the as-prepared film was observed on an atomic force microscope.The hardness and Young＇s modulus of the films were measured with a nano-indenter.The influence of friction loading and the species of counterpart ball on the tribological properties of alumina films deposited at different temperature were systematically investigated on a UMT-2 tribometer.The results indicate that the alumina films deposited at 100 °C and 200 °C were smoother with low roughness as compared with the films deposited at 50 °C and 300 °C.It was further detected that the sample with a lower roughness had a lower friction coefficient.The sample tested under applied loads of 50 mN and 80 mN was characterized by a lower friction coefficient as compared with the sample tested under 30 mN and 100 mN.Due to different hardness of the counterpart balls,different wear phenomena were observed on the worn surfaces.

关 键 词：AL2O3薄膜 原子层沉积 制备温度 对偶球 摩擦磨损 

分 类 号：TH117.1[机械工程—机械设计及理论]