激光干涉光刻工艺开发与应用研究  

Development and application research of laser interference lithography process

作　　者：于航[1] 陆冰睿[1] 陈国平[1] 刘冉[1] 

机构地区：[1]复旦大学微电子系专用集成电路与系统国家重点实验室,上海200433

出　　处：《传感器与微系统》2013年第5期9-12,共4页Transducer and Microsystem Technologies

基　　金：国家"863"计划资助项目(2011AA100706-2);国家"973"计划资助项目(2011CAB00603);复旦大学研究生创新基金资助项目

摘　　要：成功开发出以劳厄干涉为基础的激光干涉光刻系统与工艺,该工艺可在大面积范围内加工二维周期性图形,非常适合于生产光电子器件和微电子器件的周期性结构。通过实验研究了使用该工艺加工表面纳米结构的流程,对比了几种光刻胶在该工艺中的性能特点。该工艺不需要掩模、昂贵的短波长光源和成像透镜。初步实验结果表明:该工艺可以生产大面积亚微米周期的光栅、点阵以及锥形结构,为激光干涉光刻加工纳米结构的后续工作奠定了基础。A Loyld＇s-Mirror laser interference lithography system and process are developed,which can be used to fabricate in large area two dimensional periodic pattern,this process is especially suitable for fabrication of periodic structure of opto-electronic devices and micro-electronic devices.Properties of several sorts of photoresists in this process are studied.This process do not need mask,expensive lens and light source with short wavelength.Initial experimental results show large area sub-miron periodic grating,dot arrays and cone array patterns can be fabricated by this process,which establishes the exciting foundation for the nanostructure fabrication with laser interference lithography.

关 键 词：激光干涉光刻 微纳结构 光刻胶 

分 类 号：TN205[电子电信—物理电子学]