磁控溅射制备Ru-B薄膜的研究  

Study of Ru-B Films Prepared by Magnetron Sputtering

作　　者：殷聪朋[1] 管伟明[1] 张俊敏[1] 刘洪江[1] 陈勇[1] 张昆华[1] 

机构地区：[1]昆明贵金属研究所稀贵金属综合利用新技术国家重点实验室,昆明650106

出　　处：《贵金属》2013年第2期5-9,14,共6页Precious Metals

基　　金：国家自然科学基金(51262015);云南省应用基础研究重点项目(2010ZC261);云南省应用基础研究项目(2010ZC55)资助

摘　　要：采用射频磁控溅射技术制备了Ru-B薄膜,利用掠入射X射线衍射(GIXRD)、高分辨透射电子显微镜(HRTEM)、原子力显微镜(AFM)等分析技术对薄膜的相结构、沉积速率以及表面形貌进行了研究分析。结果表明:在室温下制备的Ru-B薄膜均为非晶态。薄膜的沉积速率不随溅射时间变化,但随溅射功率的增加而增大。薄膜表面光滑致密质量良好,随着溅射时间的延长,薄膜表面晶粒大小和粗糙度增大。溅射功率影响着基片表面粒子的形核长大和迁移扩散速率,进而影响薄膜的表面形貌。Ru-B films were prepared by RF magnetron sputtering technique. The phase structure, deposition rate and surface morphology of Ru-B films were researched and analyzed by glancing incidence X-ray diffraction （GIXRD）, high resolution transmission electron microscopy （HRTEM） and atomic force microscope （AFM）. The results indicated that the Ru-B films deposited at room temperature were all amorphous. The deposition rate was not changed with the gputtering time, but increased linearly with the sputtering power. The surface of films was smooth, dense and fine, and the grain size and surface roughness were increased with the sputtering time. The sputtering power affects the nucleation growth and the migration diffusion rate of substrate surface particles, and then affects the surface morphology.

关 键 词：金属材料 超硬薄膜 磁控溅射 Ru—B薄膜 表面形貌 

分 类 号：TB34[一般工业技术—材料科学与工程]