衬底温度对化学气相淀积原位生长YBa_2Cu_3O_(7-x)超导薄膜的影响  

EFFECT OF SUPPORT TEMPERATURE ON SUPERCONDUCTING FILM FABRICATED BY MOCVD

作　　者：陶卫[1] 章熙康[1] 王蓉[1] 白国仁[1] 

机构地区：[1]中国科学院上海冶金研究所,上海200050

出　　处：《低温物理学报》1991年第6期439-443,共5页Low Temperature Physical Letters

基　　金：国家超导研究发展中心资助的项目

摘　　要：利用金属有机物化学气相淀积(MOCVD)技术在氧化钇稳定的 ZrO_2(YSZ)衬底上一次生长出零电阻温度大于85K 的 YBa_2Cu_3O_(7-x)(YBCO)超导薄膜.研究了衬底温度对薄膜结构的影响,获得薄膜取向与衬底温度的关系和形成超导相的最低温度范围.此外,讨论了薄膜与衬底间的外延关系.YBa2 Cu3 O7-x (YBCO) superconducting thin film, of which zero resistance tem-perature is more than 85K, was grown on the support of the ytterbia stable ZrO2 (YSZ) by metallic organic chemical vapour deposition (MOCVD). The support temperature effect on the film structure was studied. The relationship between the film orientation and support temperature and the lowest temperature range formed superconducting phases have been obtained. In addition, the film eptaxial relation with supports is discussed in this paper.

关 键 词：MOCVD YBCO 超导薄膜 衬底 温度 

分 类 号：O484.1[理学—固体物理]