工作气压对ZnO:Mn薄膜结构特性的影响  

Influence of Working Pressure on The Structural Properties of ZnO:Mn Thin Films

作　　者：李彤[1] 介琼[1] 张宇[1] 倪晓昌[1] 赵新为[2] 

机构地区：[1]天津职业技术师范大学电子工程学院,天津300222 [2]东京理科大学物理系

出　　处：《发光学报》2013年第6期711-715,共5页Chinese Journal of Luminescence

基　　金：天津市教委(20120710;20110711)资助项目

摘　　要：利用射频磁控溅射方法在玻璃衬底上沉积了一系列ZnO:Mn薄膜,结合Raman光谱、XRD衍射谱和SEM分析了工作气压对ZnO:Mn薄膜结构特性的影响。Raman拟合光谱显示,在工作气压从1 Pa增加至4 Pa的过程中,ZnO:Mn薄膜始终保持着六角纤锌矿结构。但是,随着气压的降低,对应于E2(High)振动模式的Raman散射峰以及与Mn掺杂相关的特征峰左移,说明在低工作气压时,ZnO:Mn薄膜内晶格缺陷更多,晶格更加无序。这一结论也得到了XRD和SEM结果的证实。ZnO： Mn thin films were prepared on glass substrates using RF magnetron sputtering method. Raman spectroscopy, X-ray diffraction spectra and SEM were used to analyze the structural characteristics of ZnO： Mn films with the different working pressure. The results show that ZnO： Mn thin films have the significant wurtzite structure with the different working pressure. The leftshifts of the Raman peaks corresponding to E2 （High） mode and related to Mn doping are explained by the appearance of much more lattice defects and disorder in ZnO： Mn films with decreasing working pres- sure, which are also evidenced by XRD and SEM results.

关 键 词：ZNO MN 拉曼 稀磁半导体 

分 类 号：O484.4[理学—固体物理] TB43[理学—物理]