氧氩流量比对溅射氧化钒薄膜结构和光学性能的影响  

Influence of Gas Flow Ratio of Oxygen and Argon on Structure and Optical Properties of Sputtered Vanadium Dioxide Thin Films

作　　者：杜姗[1] 黄美东[1] 刘春伟[1] 唐晓红[1] 吕长东[1] 

机构地区：[1]天津师范大学物理与电子信息学院,天津300387

出　　处：《表面技术》2013年第4期24-27,共4页Surface Technology

基　　金：国家自然科学基金(61078059);天津师范大学推进计划项目(52X09038)

摘　　要：采用射频反应磁控溅射方法制备氧化钒(VOx)薄膜,对样品的沉积速率、物相结构、表面形貌和可见光波段的透过率进行表征,研究了在沉积气压一定的情况下,氧氩流量比对氧化钒薄膜结构和光学性能的影响。结果表明,改变氧氩流量比可明显改变薄膜结构,随着氧气比例的增加,沉积速率下降,薄膜表面出现了颗粒结构,颗粒尺寸具有增大的趋势,光透过率增大。Vanadium dioxides（VOx） films were fabricated by reactive r.f.magnetron sputtering technique.Deposition rate,phase structure,surface morphology and transmittance in visible range of the films were characterized.Influence of oxygen/argon flow ratio on structure and optical properties of the films was investigated at same deposition air pressure.Results show that the flow ratio can modify the microstructure of the films,as oxygen/argon flow ratio increases,deposition rate of the films decreases while granular size as well as transmittance of the films increases.

关 键 词：氧化钒薄膜 氧气流量 氩气流量 反应磁控溅射 

分 类 号：TG174.444[金属学及工艺—金属表面处理]