一种降低硅片方块电阻方差的通过式扩散方法  

A Box-through Diffusion Pattern to Reduce the Resistance of the Square Silicon Wafer

作　　者：郑荣豪[1] 陆利新[1] 肖乐[1] 

机构地区：[1]上海大学机电工程与自动化学院,上海200072

出　　处：《机械制造》2013年第3期26-29,共4页Machinery

基　　金：国家自然科学基金资助项目(编号:70771089)

摘　　要：为消除方块电阻不均匀性对太阳能电池板性能的影响,提出了一种通过式扩散方法。首先,设计了扩散炉结构,定义了通过式扩散方法的扩散步骤,并建立了方块电阻和扩散时间、扩散温度以及气体流量的关系的数学模型。其次,采用抽样统计方法,通过建立数学模型,计算各测试点的方块电阻及其方差,验证了该方法的有效性,为扩散工艺的改善提供借鉴。In order to eliminate the impact of the non-uniformity the square wafer resistance to the performance of the solar cell panel,a box-through diffusion pattern is proposed.First,the structure of a diffusion furnace is designed,the diffusion steps of box-through diffusion pattern are defined while the mathematical model of the relationship between the diffusion time,diffusion temperature,gas flow and the square wafer resistance is established.Secondly,by introduction of statistical sampling method and the establishment of the mathematical model,the square wafer resistance and its variance for each test point are calculated to demonstrate the effectiveness of the method and provide the reference for the improvement of the diffusion process.

关 键 词：通过式 方块电阻 方差 

分 类 号：TM914.41[电气工程—电力电子与电力传动]